Dry Film Photoresist
Feature:
| Service Location | India |
| Minimum Order Quantity | 2 |
Description:
Dry Film Photoresist:1. INTRODUCTION ASAHI KASEI E-MATERIALS DFR TM SUNFORT TM is dry film photo resist developed by our company with a combination of heretofore-developed technologies in photosensitive materials and plastics, for use in the manufacture of printed circuit boards. AQ series is fully aqueous type. The carrier film should be peeled off before developing. SUNFORT TM AQ-4038 is negative working and aqueous processability dry film photo resist which is designed to develop completely in a mild alkaline solution such as sodium carbonate (Na2CO3) and strip in a dilute alkaline such as sodium hydroxide (NaOH). SUNFORT TM AQ-4038 is high performance photo resist in etching/plating application and available in resist thickness of 40um sandwiched between layers of polyester and polyethylene film. |
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Features:
Dry Film Photoresist:
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